George Edward Alcorn Jr.
(born March 22, 1940)
Patents issued
- #4,172,004, 10/23/1979, Method for forming dense dry etched multi-level metallurgy with non-overlapped vias
- #4,201,800, 5/6/1980, Hardened photoresist master image mask process
- #4,289,834, 9/15/1981, Dense dry etched multi-level metallurgy with non-overlapped vias
- #4,472,728, 9/18/1984, Imaging X-ray spectrometer[6]
- #4,543,442, 9/24/1985, GaAs Schottky barrier photo-responsive device and method of fabrication
- #4,618,380, 10/21/1986, Method of fabricating an imaging X-ray spectrometer
- #4,062,720, 12/13/1977, Process for forming ledge-free aluminum copper silicon conductor structure
- #3,986,912, 10/19/1976, Process for controlling the wall inclination of a plasma etched via hole
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